Article 2026 MUT Institutional Repository
Effect of Precursor Solution Volume on Structural and Optical Properties of Iron Doped Titanium Dioxide Thin Films Prepared by Spin Coating
Abstract
The influence of precursor solution volume on the characteristics of containing iron-doped titanium dioxide (Fe:TiO2) thin films
was examined in this work. The coatings were prepared on transparent substrates by the spin-coating method using precursor
volumes between 0.5 and 2.5 mL. Following deposition, the coatings were heat treated at 450°C and analyzed using X-ray
diffraction (XRD), Fourier transform infrared (FTIR) spectroscopy, and ultraviolet-visible (UV-Vis) spectroscopy. XRD analysis
revealed the presence of both rutile and anatase crystalline phases, evidenced by reflections near 27.4° and 49° corresponding to
the (110) and (200) planes, respectively. Variations in precursor volume affected the crystallographic properties of the films,
with the sample prepared using 1.0 mL exhibiting the largest crystallite size and sharper diffraction peaks, suggesting improved
crystal growth. Increasing the precursor volume beyond this value resulted in peak broadening, which may be associated with
greater lattice imperfections and strain within the films. The FTIR results identified characteristic vibrational bands assigned to
Ti-O-Ti and Ti-O-Fe linkages, confirming the incorporation of iron species into the TiO2 network. Optical characterization
showed that increasing precursor volume shifted the absorption threshold toward longer wavelengths and reduced the optical
band gap. This behavior can be ascribed to the creation of defect-induced energy states and oxygen-vacancy states within the
material. Overall, the findings demonstrate that precursor solution volume significantly affects both the crystallographic and
photonic performance of Fe:TiO2 coatings, with the 1.0 mL sample providing the most favorable combination of crystallinity
and film quality.
Description
Keywords
Fe:TiO2 Thin Films, Spin Coating, Precursor Solution Volume, Anatase-rutile Phases, Thin Film Deposition
