Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
Date
2015Author
Njagi, John
Aduda, B. O.
Nyongesa, F. W.
Musembi, R. J.
Njogu, S. M.
Mwathe, P.M.
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This paper reports the results of electrical characterization of TiO2/Nb2O5 composite thin films. Uniform
TiO2 and Nb2O5 composites thin films were deposited on FTO coated glass substrate using electrophoretic deposition
(EPD) technique. The EPD voltage of 35V (DC) and deposition time of 90s, were used for various volume fractions of
Nb2O5 in composites. Uniform and crack free composite films were successfully deposited using the EPD technique as
shown by the SEM micrographs. The Hall Effect equipment was used to characterize the films through measurement
of current and the Hall voltage. Current against Hall voltage plot for films of various volume fractions of Nb2O5 were
used to determine Hall coefficients and majority charge carrier density. The sign of Hall coefficient values revealed
that TiO2/Nb2O5 composite thin films had a net n-type polarity indicating electrons were the majority charge carrier in
the composite films. The results showed that dye-sensitized solar cells should be fabricated with TiO2/Nb2O5 composites thin
films in ratio of 1:1 because such ratio 1:1 for TiO2 and Nb2O5 in composite yielded the highest electron mobility in the films.
